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Volumn 120, Issue 7, 2000, Pages 375-376

3-D Micromachining with TIEGA Process

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[No Author keywords available]

Indexed keywords


EID: 85010143483     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.120.375     Document Type: Article
Times cited : (2)

References (2)
  • 1
    • 0005242651 scopus 로고    scopus 로고
    • High Aspect Ratio Micromachinig by Synchrotron Radiation Direct Photo-Etching
    • T. Katoh and Y. Zhang, “High Aspect Ratio Micromachinig by Synchrotron Radiation Direct Photo-Etching”, Microsystem Technologies, Vol. 4, (1998) pp. 135-138.
    • (1998) Microsystem Technologies , vol.4 , pp. 135-138
    • Katoh, T.1    Zhang, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.