Deep x-ray exposure system with multistage for 3-D microfabrication

Proceedings of the International Symposium on Micro Machine and Human Science

Volumn , Issue , 2000, Pages 53-58

  You, Hui ^a   Matsuzuka, Naoki ^a   Yamaji, Tadahiro ^a   Tabata, Osamu ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; LIGHT SOURCES; MICROSTRUCTURE; SUBSTRATES; SYNCHROTRON RADIATION; THREE DIMENSIONAL; VACUUM APPLICATIONS;

MOVING MASK DEEP X-RAY LITHOGRAPHY; SYNCHROTRON LIGHT SOURCE;

X RAY LITHOGRAPHY;

EID: 0034589820     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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2. Chuanqi Li, Hui You, Lianguan Shen, Xiang Wang, "Progress on submicro lithography and nano-lithography technology", Modern Scientific Instruments, No. 1-2, 1998, pp.49-54
3. Alan D. Feinerman, Robert E. Lajos, Victor White, Denice D. Denton, "X-ray lathe: An X-ray lithographic exposure tool for nonplanar objects", Journal of Microelectromechanical Systems, 5(4), 1996, pp. 250-155
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7. 3LIGA) technology," HARMST'99