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Volumn 62, Issue 4, 2002, Pages 1251-1280
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Reduced order modeling and control of thin film growth in an HPCVD reactor
a
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Author keywords
Chemical vapor deposition; Nonlinear compensator; Nonlinear feedback tracking control; Reduced order model; State dependent Riccati equations
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
FEEDBACK CONTROL;
FILM GROWTH;
GAS DYNAMICS;
ORDINARY DIFFERENTIAL EQUATIONS;
PARTIAL DIFFERENTIAL EQUATIONS;
RICCATI EQUATIONS;
STATE ESTIMATION;
THICKNESS CONTROL;
THIN FILMS;
HIGH PRESSURE CHEMICAL VAPOR DEPOSITION;
NONLINEAR COMPENSATOR;
ORTHOGONAL DECOMPOSITION TECHNIQUE;
REDUCED ORDER MODELING;
STATE DEPENDENT RICCATI EQUATIONS;
THIN FILM GROWTH;
MATHEMATICAL MODELS;
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EID: 0036552529
PISSN: 00361399
EISSN: None
Source Type: Journal
DOI: 10.1137/S0036139901383280 Document Type: Article |
Times cited : (37)
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References (44)
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