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Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 1, 2002, Pages 249-253

Positron states in hydrogenated amorphous silicon

(8) Britton, D T a Harting M a Hempel, A a Kogel G a Sperr, P a Triftshauser W a Hempel, M a Knoesen, D a

a UNIVERSITY OF CAPE TOWN (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; HYDROGENATION; POSITRONS; RELAXATION PROCESSES;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HW-CVD);

AMORPHOUS SILICON;

EID: 0036539767 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(01)01165-6 Document Type: Conference Paper

Times cited : (4)

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