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Journal of the Electrochemical Society

Volumn 147, Issue 5, 2000, Pages 1807-1809

Etch characteristics of Pt using Cl2/Ar/O2 gas mixtures

(5) Kwon, Kwang Ho a Kang, Seung Youl b Yeom, Geun Young c Hong, Nam Kwan a Lee, Jin Ho b

a Hanseo University (South Korea)

b Electronics and Telecommunications Research Institute (ETRI) (South Korea)

c Sungkyunkwan University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; BINDING ENERGY; CHEMICAL REACTIONS; GASES; MASS SPECTROMETRY; MIXTURES; PLATINUM; PROBES; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS MIXING RATIOS; GAS MIXTURES; LANGMUIR PROBE;

PLASMA ETCHING;

EID: 0033737882 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1393438 Document Type: Article

Times cited : (13)

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