Study of the solid phase crystallization behavior of amorphous sputtered silicon by X-ray diffraction and electrical measurements

Solar Energy Materials and Solar Cells

Volumn 72, Issue 1-4, 2002, Pages 551-558

  Farhi, G ^a   Aoucher, M ^a   Mohammed Brahim, T ^b  

^a UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

^b UNIVERSITÉ DE RENNES 1   (France)

Author keywords

Electrical conductance; Hydrogenated amorphous films; Solid phase crystallization; X ray diffraction

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; ANNEALING; CRYSTALLIZATION; ELECTRIC CONDUCTANCE; MAGNETRON SPUTTERING; RATE CONSTANTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SOLID PHASE CRYSTALLIZATION (SPC);

AMORPHOUS SILICON;

EID: 0036533367     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(01)00204-5     Document Type: Conference Paper

References (18)