SCOPUS 정보 검색 플랫폼

Volumn 237-239, Issue 1-4, 2002, Pages 448-454

Growth of ferroelectric PbZrxTi1-xO3 thin films by metalorganic chemical vapor deposition (MOCVD)

(4) Shimizu, Masaru a Fujisawa, Hironori a Niu, Hirohiko a Honda, Koichiro b

Author keywords

A1. Atomic force microscopy; A1. Growth models; A3. Metalorganic chemical vapor deposition; B1. Oxides; B1. Perovskites; B2. Ferroelectric materials

Indexed keywords

ATOMIC FORCE MICROSCOPY; FERROELECTRIC THIN FILMS; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

VOLMER-WEBER GROWTH MODES;

FILM GROWTH;

EID: 0036530799 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(01)01968-6 Document Type: Article

Times cited : (35)

References (34)

1
- 0006157839
- (1982) Jpn. J. Appl. Phys. , vol.21 , pp. L655
- Nakagwa, T.¹ Yamaguchi, J.² Okuyama, M.³ Hamakawa, Y.⁴

2
- 0024137144
- in Japanese
- (1988) J. Ceram. Soc. Japan , vol.96 , pp. 687
- Okada, M.¹ Watanabe, O.² Murakami, M.³ Nishiwaki, A.⁴ Tomita, T.⁵

3
- 0001688717
- (1988) Appl. Phys. Lett. , vol.53 , pp. 1702
- Kwak, B.S.¹ Boyd, E.P.² Erbil, A.³

4
- 0025416386
- (1990) Jpn. J. Appl. Phys. , vol.29 , pp. 718
- Okada, M.¹ Tominaga, K.² Araki, T.³ Katayama, S.⁴ Sakashita, T.⁵

5
- 0028761889
- (1994) J. Crystal Growth , vol.145 , pp. 226
- Shimizu, M.¹ Sugiyama, M.² Fujisawa, H.³ Hamano, T.⁴ Shiosaki, T.⁵ Matsushige, K.⁶

6
- 0033346947
- (1999) Thin Solid Films , vol.357 , pp. 166
- Wakiya, N.¹ Kuroyanagi, K.² Xuan, Y.³ Shinozuka, K.⁴ Mizutani, N.⁵

7
- 84913021958
- (1992) J. Vac. Sci. Technol. , vol.10 , pp. 1578
- Van Buskirk, P.C.¹ Gardiner, R.² Kirlin, P.S.³ Krupanidhi, S.⁴

8
- 0027810987
- (1993) Mater. Res. Soc. Symp. Proc. , vol.310 , pp. 487
- Lesaicherre, P.-Y.¹ Yamaguchi, H.² Sakuma, T.³ Miyasaka, Y.⁴ Yoshida, M.⁵ Ishitani, A.⁶

9
- 0029197462
- (1995) J. Electrochem. Soc. , vol.142 , pp. 244
- Yoshida, Y.¹ Yamaguchi, H.² Sakuma, T.³ Miyasaka, Y.⁴

10
- 0026976228
- Urbana Champaign, IEEE Service Center, Piscataway
- (1990) Proceedings of the Seventh IEEE International Symposium on Applications of Ferroelectrics , pp. 669
- Shimizu, M.¹ Katayama, T.² Shiosaki, T.³ Kawabata, A.⁴

11
- 0026923177
- (1992) Jpn. J. Appl. Phys. , vol.31 , pp. 3005
- Katayama, T.¹ Sugiyama, M.² Shimizu, M.³ Shiosaki, T.⁴

12
- 0006241573
- Montreux, IEEE Service Center, Piscataway
- (1998) Proceedings of the 11th IEEE International Symposium on Applications of Ferroelectrics , pp. 43
- Chen, Y.M.¹ Rituman, D.² Wu, N.J.³ Ignatiev, A.⁴

13
- 0027660324
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 4078
- Hirai, T.¹ Goto, T.² Mitsuhashi, H.³ Tanimoto, S.⁴ Tarui, Y.⁵

14
- 0028463557
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 4066
- Sotone, Y.¹ Senzaki, J.² Morita, S.³ Tanimoto, S.⁴ Hirai, T.⁵ Ueno, T.⁶ Kuroiwa, K.⁷ Tarui, Y.⁸

15
- 0035302377
- (2001) Jpn. J. Appl. Phys. , vol.40 , pp. L343
- Aratani, M.¹ Ozeki, T.² Funakubo, H.³

16
- 84992282155
- 98CH36217
- (1998) IEDM Tec. Dig.
- Amanuma, K.¹ Tatsumi, T.² Maejima, Y.³ Takahashi, S.⁴ Hada, H.⁵ Okizaki, H.⁶ Kunio, T.⁷

17
- 85051964536
- (1993) VLSI Tech. Symp. Tech. Dig. , pp. 49
- Kashihara, K.¹ Okudaira, T.² Itoh, H.³ Higashi, T.⁴ Abe, H.⁵

18
- 0027850653
- (1993) Mater. Res. Soc. Symp. Proc. , vol.310 , pp. 255
- Shimizu, M.¹ Fujimoto, M.² Katayama, T.³ Shiosaki, T.⁴ Nakaya, K.⁵ Fukagawa, M.⁶ Tanikawa, E.⁷

19
- 0028511733
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 5167
- Shimizu, M.¹ Sugiyama, M.² Fujisawa, H.³ Shiosaki, T.⁴

20
- 0028538819
- (1994) J. Mater. Res. , vol.9 , pp. 2959
- Wasa, K.¹ Satho, T.² Tabata, K.³

21
- 0031223593
- (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 5793
- Fukuda, Y.¹ Aoki, K.²

22
- 0002829850
- (1990) Ferroelectrics , vol.108 , pp. 71
- Swartz, S.L.¹ Bright, S.J.² Melling, P.J.³ Shrout, T.R.⁴

23
- 0006183396
- (1992) Mater. Res. Soc. Symp. Proc. , vol.243 , pp. 275
- Baude, P.F.¹ Ye, C.² Tamagawa, T.³ Polla, D.L.⁴

24
- 5944253364
- (1996) Integr. Ferroelectr. , vol.6 , pp. 155
- Shimizu, M.¹ Sugiyama, M.² Fujisawa, H.³ Shiosaki, T.⁴

25
- 0034473083
- Hawaii, 2000, IEEE Service Center Piscataway
- (2001) Proceedings of the 12th IEEE International Symposium on Applications of Ferroelectrics , pp. 961
- Shimizu, M.¹ Kita, K.² Fujisawa, H.³ Tomozawa, N.⁴ Niu, H.⁵

26
- 4243778283
- (2001) Mater. Res. Soc. Symp. Proc. , vol.655 , pp. CC1101
- Shimizu, M.¹ Kita, K.² Fujisawa, H.³ Niu, H.⁴

27
- 0033696885
- (2000) Mater. Res. Soc. Symp. Proc. , vol.596 , pp. 321
- Fujisawa, H.¹ Shimizu, M.² Niu, H.³ Honda, K.⁴ Ohtani, S.⁵

28
- 0034262637
- (2000) Jpn. J. Appl. Phys. , vol.39 , pp. 5446
- Fujisawa, H.¹ Morimoto, K.² Shimizu, M.³ Niu, H.⁴ Honda, K.⁵ Ohtani, S.⁶

29
- 0028652308
- (1994) Science , vol.266 , pp. 1540
- Kawasaki, M.¹ Takahashi, K.² Maeda, T.³ Tsuchiya, R.⁴ Shinohara, M.⁵ Ishiyama, O.⁶ Yonezawa, T.⁷ Yoshimoto, M.⁸ Koinuma, H.⁹

30
- 36449006721
- (1994) Appl. Phys. Lett. , vol.65 , pp. 3197
- Yoshimito, M.¹ Maeda, T.² Shimozono, K.³ Koinuma, H.⁴ Shinohara, M.⁵ Ishiyama, O.⁶ Ohtani, F.⁷

31
- 0032594492
- (1999) Jpn. J. Appl. Phys. , vol.38 , pp. 3946
- Iwahori, K.¹ Watanabe, S.² Komeda, T.³ Kawai, M.⁴ Saito, A.⁵ Kuwahara, Y.⁶ Aono, M.⁷

32
- 0006220763
- (2001) Proceedings of the ICCG-13/ICVGE-11
- Fujisawa, H.¹ Nonomura, H.² Shimizu, M.³ Niu, H.⁴

33
- 0942273373
- (2001) Mater. Res. Soc. Symp. Proc. , vol.655 , pp. CC1041
- Fujisawa, H.¹ Morimoto, K.² Shimizu, M.³ Niu, H.⁴ Honda, K.⁵ Ohtani, S.⁶

34
- 84992237853
- (2001) Jpn. J. Appl. Phys. , vol.40 , pp. 40
- Fujisawa, H.¹ Kita, K.² Shimizu, M.³ Niu, H.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.