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Volumn 237-239, Issue 1-4 II, 2002, Pages 1410-1417
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Microchannel epitaxy: An overview
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Author keywords
A1. Defects; A3. Liquid phase epitaxy A3. Molecular beam epitaxy A3. Selective epitaxy; B2. Semiconducting gallium arsenides B2. Semiconducting gallium compounds B2. Semiconducting III V materials B2. Semiconducting silicon
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Indexed keywords
AMORPHOUS FILMS;
CRYSTAL DEFECTS;
CRYSTAL LATTICES;
EPITAXIAL GROWTH;
INTERFACES (MATERIALS);
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING GALLIUM COMPOUNDS;
SEMICONDUCTING SILICON;
SUBSTRATES;
THICKNESS MEASUREMENT;
MICROCHANNEL EPITAXY;
SINGLE CRYSTALS;
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EID: 0036530612
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(01)02227-8 Document Type: Article |
Times cited : (68)
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References (36)
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