Surface and interface morphology of CoSi2 films formed by multilayer solid-state reaction

Materials Characterization

Volumn 48, Issue 2-3, 2002, Pages 229-235

  Ru, Guo Ping ^a   Li, Bing Zong ^a   Jiang, Guo Bao ^a   Qu, Xin Ping ^a   Liu, Jing ^a   Van Meirhaeghe, R L ^b   Cardon, F ^b  

^a FUDAN UNIVERSITY   (China)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COBALT COMPOUNDS; INTERFACES (MATERIALS); MORPHOLOGY; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY;

INTERFACE MORPHOLOGY;

SEMICONDUCTING FILMS;

EID: 0036526408     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1044-5803(02)00252-8     Document Type: Conference Paper

References (22)

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