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Volumn 48, Issue 2-3, 2002, Pages 229-235
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Surface and interface morphology of CoSi2 films formed by multilayer solid-state reaction
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
COBALT COMPOUNDS;
INTERFACES (MATERIALS);
MORPHOLOGY;
SURFACE ROUGHNESS;
THERMODYNAMIC STABILITY;
INTERFACE MORPHOLOGY;
SEMICONDUCTING FILMS;
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EID: 0036526408
PISSN: 10445803
EISSN: None
Source Type: Journal
DOI: 10.1016/S1044-5803(02)00252-8 Document Type: Conference Paper |
Times cited : (5)
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References (22)
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