Atomic force microscopy study of thin CoSi2 films formed by solid state reaction

International Conference on Solid-State and Integrated Circuit Technology Proceedings

Volumn , Issue , 1998, Pages 328-331

  Ru, Guo Ping ^a   Liu, Jing ^a   Qu, Xin Ping ^a   Li, Bing Zong ^a   Detavernier, C ^a   Van Meirhaeghe, R L ^a   Cardon, F ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ANNEALING; ATOMIC FORCE MICROSCOPY; COBALT COMPOUNDS; ELECTRIC RESISTANCE; SEMICONDUCTING SILICON COMPOUNDS; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY; THIN FILMS;

SOLID STATE REACTIONS;

SEMICONDUCTING FILMS;

EID: 0032226902     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (13)