Key technologies of a focused ion beam system for single ion implantation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2479-2483

  Matsukawa, T ^a   Shinada, T ^a   Fukai, T ^a   Ohdomari, I ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009743745     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590194     Document Type: Article

References (8)

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5. T. Shinada, Y. Kumura, J. Okabe, T. Matsukawa, and I. Ohdomari, these proceedings.
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7. H. Kang, K. H. Park, C. Kim, B. S. Shim, S. Kim, and D. W. Moon, Nucl. Instrum. Methods Phys. Res. B 67, 312 (1992).
8. S. Bouffard, J. Cousty, Y. Pennee, and F. Thibaudau, Radiat. Eff. Defects Solids 126, 225 (1993).