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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 3 A, 2002, Pages

Correlation of electrical, thermal and structural properties of microcrystalline silicon thin films

(6) Das, Debajyoti a,c Jana, Madhusudan b Barua, Ashok K a Chattopadhyay, Surajit b Chen, Li Chyong a Chen, Kuei Hsien b

a DEPARTMENT OF MATERIALS SCIENCE (India)

b INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES (Taiwan)

c NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

Crystalline volume fraction; Electrical conductivity; Microcrystalline silicon thin film; Thermal diffusivity

Indexed keywords

AMORPHOUS SILICON; CORRELATION THEORY; ELECTRIC CONDUCTIVITY; PARAMETER ESTIMATION; PERCOLATION (SOLID STATE); THERMAL DIFFUSION; VOLUME FRACTION;

MICROCRYSTALLINE SILICON THIN FILMS;

THIN FILMS;

EID: 0036508841 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.l229 Document Type: Article

Times cited : (18)

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