Surface smoothing of diamond membranes by reactive ion etching process

Diamond and Related Materials

Volumn 5, Issue 6-8, 1996, Pages 840-844

  Vivensang, C ^a,c   Ferlazzo Manin, L ^b   Ravet, M F ^b   Turban, G ^a   Rousseaux, F ^b   Gicquel, A ^c  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b CNRS   (France)

^c UNIVERSITÉ PARIS 13   (France)

Author keywords

Diamond; Membrane; Planarization; Reactive ion etching

Indexed keywords

EID: 0002469286     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00368-1     Document Type: Article

References (10)

1. E. Anger, A. Gicquel, M.F. Ravet, Z.Z. Wang, F. Rousseaux, J. Perrière, F. Rossi, D. Fournier and K. Plamann, Le Vide, 276 (1995) 139.
2. A. Gicquel, E. Anger, M.F. Ravet, D. Fabre, G. Scatena and Z.Z. Wang, Diamond Relat. Mater., 2 (1993) 417.
3. C. Wild, P. Koidl, N. Herres, W. Müller-Sebert, H. Walcher, R. Kohl, N. Herres, R. Locher, R. Samleski and R. Brenn, Diamond Relat. Mater., 2 (1993) 158.
4. A. Hirata, H. Tokura and M. Yoshikawa, Thin Solid Films, 212 (1992) 43.
5. S. Jin, L.H. Chen and J.E. Graebner, 2nd Int. Conf. on the Applications of Diamond Films and Related Materials, MYU, Tokyo, 1993.
6. M. Yoshikawa, SPIE, 1325 (1990) 210.
7. A. Gicquel, K. Hassouni, S. Farhat, Y. Breton, C.D. Scott, M. Lefebvre and M. Pealat, Diamond Relat. Mater., 3 (1994) 581.
8. M.F. Ravet, A. Gicquel, E. Anger, Z.Z. Wang, Y. Chen and F. Rousseaux, in M. Yoshikawa, M. Murakawa, Y. Tzeng and W.A. Yarbrough (eds.), Applications of Diamond Films and Related Materials, MYU, Tokyo, 1993, p. 77.
9. I. Llewellyn, R. Chittick and R. Heinecke, SPIE, 2286 (1994) 198-204.
10. C. Vivensang, L. Ferlazzo-Manin, M.F. Ravet, F. Rousseaux, G. Turban and A. Gicquel, Proc. 10th Int. Colloq. on Plasma Processes, 275 (1995) 167.