Atomistic simulation of the bombardment process during the BEN phase of chemical vapor deposition (CVD) of diamond

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 513-518

  Kohary, K ^a   Kugler, S ^a   Hajnal, Z ^b   Kohler T ^b   Frauenheim, T ^b   Katai S ^a   Deak P ^a  

^a BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

^b UNIVERSITY OF PADERBORN   (Germany)

Author keywords

Carbon vapor deposition (CVD); Computer simulation; Ion bombardment; Nucleation

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; IONS; MOLECULAR DYNAMICS; NUCLEATION;

ATOMISTIC SIMULATION;

DIAMOND FILMS;

VAPOR DEPOSITION;

EID: 0036508286     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00574-X     Document Type: Article

References (18)