Combinatorial methodologies offer potential for rapid research of photoresist materials and formulations

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 2, 2002, Pages 704-709

  Lenhart, Joseph L ^a   Jones, Ronald L ^a   Lin, Eric K ^a   Soles, Christopher L ^a   Wu, Wen Li ^a   Goldfarb, Dario L ^b   Angelopoulos, Marie ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ATOMIC FORCE MICROSCOPY; CATALYSIS; COPOLYMERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; INTERFACIAL ENERGY; PHASE SEPARATION; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SHRINKAGE; THERMOGRAVIMETRIC ANALYSIS; THROUGHPUT;

PHOTORESIST FILMS;

PLASTIC FILMS;

EID: 0036504608     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1463069     Document Type: Article

References (18)