Nanofabrication of grid-patterned substrate by holographic lithography

Journal of Crystal Growth

Volumn 236, Issue 1-3, 2002, Pages 141-144

  Huang, C J ^a   Zhu, X P ^a   Li, C ^a   Zuo, Y H ^a   Cheng, B W ^a   Li, D Z ^a   Luo, L P ^a   Yu, J Z ^a   Wang, Q M ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

A1 Nanostructures; A1. Etching; A1. substrates

Indexed keywords

CRYSTAL ORIENTATION; HOLOGRAPHY; NANOTECHNOLOGY; REACTIVE ION ETCHING; SELF ASSEMBLY; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR QUANTUM DOTS; SILICON; SINGLE CRYSTALS; SUBSTRATES;

GRID-PATTERNED SUBSTRATES; HOLOGRAPHIC LITHOGRAPHY;

NANOSTRUCTURED MATERIALS;

EID: 0036499287     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)02388-0     Document Type: Article

References (9)