Structural and magnetic properties of Fe-Ge layer produced by Fe ion-implantation into germanium

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1410-1416

  Venugopal, R ^a   Sundaravel, B ^a   Wilson, I H ^a   Wang, F W ^b   Zhang, X X ^b  

^a CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE QUALITY; DEPTH PROFILE; FE-IONS; HIGH TEMPERATURE; HIGH-DOSE IMPLANTATION; IMPLANTED LAYERS; LOW DOSE; METAL VAPOR VACUUM ARCS; RUTHERFORD BACKSCATTERING SPECTROMETRY; STRUCTURAL AND MAGNETIC PROPERTIES; SUPERCONDUCTING QUANTUM INTERFERENCE DEVICE MAGNETOMETRY; TRANSMISSION ELECTRON MICROSCOPY TEM; XPS MEASUREMENTS;

AUGER ELECTRON SPECTROSCOPY; ION SOURCES; IRON COMPOUNDS; MAGNETIC PROPERTIES; PHOTOELECTRONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SQUIDS; SUPERPARAMAGNETISM; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

GERMANIUM;

EID: 0036470128     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1427135     Document Type: Article

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