메뉴 건너뛰기




Volumn 12, Issue 2, 2002, Pages 122-127

Electrodeposition through thick photoresist moulds for the fabrication of a sharp chromium microtip

(2)  Lennon, E a   Ayela, F a  

a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; CURRENT DENSITY; ELECTROLYTES; FABRICATION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; PHOTOLITHOGRAPHY; PHOTORESISTS; TEMPERATURE;

EID: 0036466299     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/12/2/305     Document Type: Article
Times cited : (7)

References (9)
  • 5
    • 0006445406 scopus 로고    scopus 로고
    • Traité de galvanotechnique, Galva-conseils edition
    • (1996)
    • Lacourcelle, L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.