|
Volumn 12, Issue 2, 2002, Pages 122-127
|
Electrodeposition through thick photoresist moulds for the fabrication of a sharp chromium microtip
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CHROMIUM;
CURRENT DENSITY;
ELECTROLYTES;
FABRICATION;
MICROELECTROMECHANICAL DEVICES;
MICROMACHINING;
MICROSTRUCTURE;
PHOTOLITHOGRAPHY;
PHOTORESISTS;
TEMPERATURE;
CHEMICAL DAMAGE;
CHROMIUM ELECTROPLATED STRUCTURE;
CHROMIUM MICROTIP;
ULTRAVIOLET LITHOGRAPHY;
ELECTROPLATING;
|
EID: 0036466299
PISSN: 09601317
EISSN: None
Source Type: Journal
DOI: 10.1088/0960-1317/12/2/305 Document Type: Article |
Times cited : (7)
|
References (9)
|