Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range

Analytical and Bioanalytical Chemistry

Volumn 374, Issue 4, 2002, Pages 631-634

  Procop, Mathias ^a   Radtke, M ^a   Krumrey, M ^b   Hasche, K ^b   Schadlich S ^c   Frank, W ^d  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^d LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Electron probe microanalysis, EPMA; Thickness measurement; Thin films; X rays

Indexed keywords

MICROANALYSIS; PLATINUM; SILICA; SPECTRUM ANALYZERS; THICKNESS MEASUREMENT;

SPECTRAL INTENSITIES;

THIN FILMS;

NICKEL; PLATINUM; SILICON DIOXIDE;

CALCULATION; CONFERENCE PAPER; ELECTRON PROBE MICROANALYSIS; FILM; THICKNESS;

EID: 0036455726     PISSN: 16182642     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00216-002-1514-5     Document Type: Conference Paper

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