Enabling technologies for plastic displays

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4712, Issue , 2002, Pages 222-236

  Sturm, J C ^a   Gleskova, H ^a   Jackson, T N ^b   Fonash, S J ^c   Wagner, S ^a  

^a Princeton University   (United States)

^b The Center for Nanotechnology Education and Utilization   (United States)

^c PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

Amorphous silicon; Deformation; Organic semiconductor; Plastic; Polycrystalline silicon; Polysilicon; Printing; Rolling; TFT; Thin film transistor

Indexed keywords

AMORPHOUS SILICON; DEFORMATION; ELECTRONIC EQUIPMENT TESTING; LIGHT EMITTING DIODES; PLASTICS; POLYCRYSTALLINE MATERIALS; POLYSILICON; SCREEN PRINTING; SEMICONDUCTING POLYMERS; SUBSTRATES; THIN FILM TRANSISTORS;

PLASTIC DISPLAYS; POLYCRYSTALLINE SILICON;

DISPLAY DEVICES;

EID: 0036441237     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.480927     Document Type: Conference Paper

References (41)

1. Y. Lee, S. Bae, and S. Fonash, Extended Abstract, Electrochemical Society Meeting 2000-2, 791 (2000).
2. A. Kaan, S. Bae, H. Li, and S. Fonash, Journal of Applied Physics 88, 555 (2000).
3. Y. Y. Lin, A.Dodabalapur, R.Sarpeshkar, Z.Bao, W.Li, K.Baldwin, V.R.Raju, and H.E. Katz, Appl. Phys. Lett., 74, 2714 (1999).
4. B. Crone, A. Dodabalapur, Y.-Y. Lin, W. Filas, Z. Bao, A. Laduca, R. Sarpeshkar, H.E. Katz, and W. Li, Nature, 403, 521 (2000).
5. G. H. Gelinck, T.C.T. Geuns, and D. M. de Leeuw, Appl. Phys. Lett., 77, 1487 (2000).
6. M. G. Kane, J. Campi, F. P. Cuomo, B. Greening, C. D. Sheraw, J. A. Nichols, D. J. Gundlach, J. R. Huang, C. C. Kuo, L. Jia, H. Klauk, and T. N. Jackson, IEEE Electron Device Letters, 21, 534 (2000).
7. J. H. Schon, S. Berg, Ch. Klock, and B. Batlogg, Science, 287, 1022 (2000).
8. D. J. Gundlach, H. Klauk, C. D. Sheraw, C.-C. Kuo, J.-R. Huang, and T. N. Jackson, 1999 International Electron Devices Meeting Technical Digest, 249 (1999).
9. H. Kuma, T. Iwakuma, F. Moriwaki, M. Fukuda, T. Sekiya, M. Araki, Y. Saito, M. Gomyo, and T. Mita, 2001 SID Digest of Technical Papers 32, 12 (2001)
10. J.K. Mahon, ibid., 32, p. 22
11. M.G. Kane et al., ibid., 32, p. 57
12. K. Amundson, J. Ewing, P. Kazlas, R. McCarthy, J.D. Albert, R. Zehner, P. Drzaic, J. Rogers, Z. Bao, and K. Baldwin, ibid., 32, p. 160.
13. R.G. Stewart, ibid., 32, p. 264.
14. S. Yamamoto et al., ibid. 32, p. 362.
15. S. Aomori, T. Maruyama, Y.,Nakatani, and M. Yoshida, ibid., 32, p. 558.
16. S.K. Park, J.I. Han, W.K. Kim, M.G. Kwak, S.J. Hong, and C.J. Lee, ibid., 32, p. 658.
17. Y. Chen, K. Denis, P. Kazlas, and P. Drzaic, ibid., 32, p. 157.
18. H. Gleskova and S. Wagner, IEEE Electron Dev. Lett. 20, 473 (1999).
19. E.Y. Ma and S. Wagner, Appl. Phys. Lett. 74, 2661 (1999).
20. Z. Suo, E.Y. Ma, H. Gleskova, and S. Wagner, Appl. Phys. Lett. 74, 1177 (1999).
21. H. Gleskova, S. Wagner, and Z. Suo, Appl. Phys. Lett. 75, 3011 (1999).
22. H. Gleskova, S. Wagner, V. Gašparík, and P. Kováč, J. Electrochem. Soc. 148, G370 (2001).
23. F. Jansen and M.A. Machonkin, J. Vac. Sci. Technol. A 6, 1696 (1988).
24. Kapton E.: J.A. Kreuz, S.N. Milligan, and R.F. Sutton, DuPont Films Technical Paper 3/94, Reorder No. H-54504.
25. S. Sherman, S. Wagner, and R.A. Gottscho, Appl. Phys. Lett. 69, 3242 (1996).
26. S. Sherman, P.Y. Lu, R.A. Gottscho, and S. Wagner, Mat. Res. Soc. Proc. 377, 749 (1995).
27. G.D. Cody, T. Tiedje, B. Abeles, B. Brooks, and Y. Goldstein, Phys. Rev. Lett. 47, 1480 (1981).
28. B. Welber and M.H. Brodsky, Phys. Rev. B 16, 3660 (1977).
29. L. Tanaka, Solid State Commun. 60, 295 (1986).
30. P. Alpuim, V. Chu, and J.P. Conde, Mat. Res. Soc. Proc. 664 - to be published.
31. D.R. Cairns, R.P. Witte II, D.K. Sparacin, S.M. Sachsman, D.C. Paine, and G.P. Crawford, Appl. Phys. Lett. 76, 1425 (2000).
32. P.I. Hsu, M. Huang, S. Wagner, Z. Suo, and J. C. Sturm, Mater. Res. Soc. Symp. Proc. 621, Q8.6.1 (2000).
33. I. Sample, New Scientist 170, 23 (2001).
34. P.I. Hsu, R. Bhattacharya, H. Gleskova, Z. Xi, Z. Suo, S. Wagner, and J.C. Sturm, Tech. Abs. Device Research Conf. (June 2002).
35. R. Bhattacharya, P.I. Hsu, J.C. Sturm, and S. Wagner, presented at the 2001 Mat. Res. Soc. Spring Meet. Symp. Z, San Francisco, CA, USA, 2001.
36. P.I. Hsu, R. Bhattacharya, H. Gleskova, Z. Xi, Z. Suo, S. Wagner, and J.C. Sturm, "Thin Film Transistor Circuits on Large-Area Spherical Surfaces," submitted for publication, 2002.
37. Sigurd Wagner, Stephen J. Fonash, Thomas N. Jackson, and James C. Sturm, "Flexible-display enabling technology," Proc. SPIE. 4362 (2001).
38. F. Pschenitzka, and J.C. Sturm, "Patterned dye diffusion using transferred photoresist for Polymer OLED displays, Proc. SPIE 4105, 59 (2000).
39. F. Pschenitzka and J.C. Sturm, "Solvent-enhanced dye diffusion in polymer thin films for color tuning of organic light-emitting diodes," Appl. Phys. Lett. 78, 2584-2586 (2001).
40. K. Long, M.-H. Lu, F Pschenitzka and J.C. Sturm, "Mat. Res. Soc. Symp. Proc." 708, (2001).
41. F. Pschenitzka and J.C. Sturm, "Excitation mechanisms in dye-doped organic light-emitting devices," Appl. Phys. Lett. 4354 (2001).