High transmission attenuated PSM - benefits and limitations through a validation study of 33%, 20% and 6% transmission masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Kachwala, Nishrin ^a   Petersen, John S ^a   McCallum, Martin ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; FOCUSING; IMAGING TECHNIQUES; LIGHT TRANSMISSION; LIGHTING; PHOTOLITHOGRAPHY;

DEPTH OF FOCUS (DOF); PHASE SHIFT MASKS (PSM); TRANSMISSION MASKS;

MASKS;

EID: 0033684956     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)