Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100 nm gate fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Kim, Keeho ^a   Mason, Mark E ^a   Randall, John ^a   Kim, Won ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATION; FOCUSING; LOGIC GATES; MASKS; PHASE SHIFT; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET LITHOGRAPHY; MASK ERROR FACTOR; PHASE SHIFTING MASKS;

PHOTOLITHOGRAPHY;

EID: 0033698130     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)