Evaluating the potential of alternating phase shift masks using lithography simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 590-599

  Friedrich, Christoph ^a   Ergenzinger, Klaus ^a   Gans, Fritz ^a   Grassmann, Andreas ^a   Griesinger, Uwe ^a   Knobloch, Juergen ^a   Mader, Leonhard ^a   Maurer, Wilhelm ^a   Pforr, Rainer ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FOCUSING; MASKS; PHASE SHIFT;

ALTERNATING PHASE SHIFT MASKS; DOUBLE EXPOSURE; INTENSITY BALANCING; PROCESS WINDOW;

PHOTOLITHOGRAPHY;

EID: 0032652496     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354371     Document Type: Conference Paper

References (13)