Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 619-625

  Fiedorowicz, Henryk ^a   Bartnik, Andrzej ^a   Jarocki, Roman ^a   Kostecki, Jerzy ^a   Rakowski, Rafał ^a   Szczurek, Mirosław ^a  

^a MILITARY UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Gas puff target; Laser plasma x ray sources; Laser plasmas; Lithography

Indexed keywords

CHARGE COUPLED DEVICES; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; NEODYMIUM LASERS; OPTIMIZATION; PLASMA SOURCES;

GAS PUFF TARGETS;

X RAY LITHOGRAPHY;

EID: 0036379040     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472337     Document Type: Conference Paper

References (12)

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9. H. Fiedorowicz, A. Bartnik, H. Daido, R. Jarocki, R. Rakowski, M. Suzuki, M. Szczurek, S. Yamagami, in Proc. SPIE vol. 4343, Emerging Lithographic Technologies V, ed. E. Dobisz (SPIE Press, Bellingham, 2001)
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