Status of fabrication of square format masks for extreme ultraviolet lithography (EUVL) at the MCoC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 161-172

  Racette, Kenneth ^a   Williams, Carey ^a   Fisch, Emily ^a   Kindt, Louis ^a   Lawliss, Mark ^a   Ackel, Robin ^a   Lercel, Michael ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

45 nm; Absorber; Buffer; Chromium; Etch; EUVL; NGL

Indexed keywords

ABSORPTION; ELECTRON BEAMS; MASKS; PHOTOLITHOGRAPHY;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

ULTRAVIOLET RADIATION;

EID: 0036378992     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472286     Document Type: Conference Paper

References (6)

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