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Volumn 687, Issue , 2002, Pages 285-290

Fracture strength of polysilicon thin films at stress concentrations

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; FRACTOGRAPHY; FRACTURE MECHANICS; MECHANICAL VARIABLES MEASUREMENT; MICROELECTROMECHANICAL DEVICES; STRENGTH OF MATERIALS; STRESS ANALYSIS; STRESS CONCENTRATION; TENSILE TESTING; THIN FILMS;

EID: 0036351687     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (10)
  • 10
    • 0010182618 scopus 로고    scopus 로고
    • ASTM standard C1239-95, Standard practice for reporting uniaxial strength data and estimating Weibull distribution parameters for advanced ceramics


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.