SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 33, Issue 1, 2002, Pages 35-40

Radio frequency GDOES depth profiling analysis of a B-doped diamond film deposited onto Si by microwave plasma CVD

(4) Shimizu, K a Einaga, Y a Fujishima, A b Ohnishi, K b

a KEIO UNIVERSITY (Japan)

b UNIVERSITY OF TOKYO (Japan)

Author keywords

CVD; Diamond; Films; GDOES; Glow discharge optical emission spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON; DIAMOND FILMS; DOPING (ADDITIVES); EMISSION SPECTROSCOPY; GLOW DISCHARGES; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SPUTTERING; SURFACE PHENOMENA;

BORON DOPED DIAMOND FILMS; DEPTH PROFILING ANALYSIS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; RADIO FREQUENCY GLOW DISCHARGE OPTICAL EMISSION SPECTROSCOPY;

SURFACES;

EID: 0036173272 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1158 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.