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Volumn 29, Issue 2, 2000, Pages 155-159
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Influence of argon pressure on the depth resolution during GDOES depth profiling analysis of thin films
a b c c c
a
KEIO UNIVERSITY
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINA;
ALUMINUM;
ARGON;
DEGRADATION;
EMISSION SPECTROSCOPY;
INTERFACES (MATERIALS);
PRESSURE EFFECTS;
SPUTTERING;
THIN FILMS;
DEPTH PROFILING ANALYSIS;
GLOW DISCHARGE OPTICAL EMISSION SPECTROSCOPY (GDOES);
AMORPHOUS FILMS;
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EID: 0033908172
PISSN: 01422421
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1096-9918(200002)29:2<155::AID-SIA729>3.0.CO;2-G Document Type: Article |
Times cited : (12)
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References (11)
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