Simple design for the transportation of ex situ prepared hydrogen passivated silicon

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 1, 2002, Pages 285-287

  MacLaren, D A ^a   Curson, N J ^a   Atkinson, P ^a   Holst, B ^b   Johnson, D J ^a   Allison, W ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b MAX PLANCK INSTITUTE FOR DYNAMICS AND SELF ORGANIZATION   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; HYDROGEN; OXIDATION; PASSIVATION; SILICON; SURFACE PHENOMENA; WATER; WETTING;

HYDROGEN PASSIVATION; WET CHEMICAL PROCESS;

CHEMICAL REACTORS;

EID: 0036165625     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1419084     Document Type: Article

References (12)