Single crystal optic elements for helium atom microscopy

Review of Scientific Instruments

Volumn 71, Issue 7, 2000, Pages 2625-2634

  MacLaren, D A ^a   Allison, W ^a   Holst, B ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b MAX PLANCK INSTITUTE FOR DYNAMICS AND SELF ORGANIZATION   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008189673     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150667     Document Type: Article

References (34)

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22. 1,2. In practice, the change is slight and not observed to alter aberrations significantly.
23. Wafers purchased from Virginia Semiconductor, Inc., Fredericksburg, VA 22401-4647.
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30. Calculation conducted by the MAPLE software package for symbolic mathematical analysis. Information available at time of press at: http:// www.maplesoft.com.
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33. Aberrations are calculated as in Ref. 12 and consider an atomic beam diverging from a point source to strike the crystal center with a beam radius of 1 mm. The distance, in the image plane, between a ray reflected from the crystal center and one reflected from the beam perimeter gives the aberration.
34. We may also consider Fig. 10 to quantify the susceptibility to manufacturing errors such as a misaligned electrode. Since a crystal off-set of a few hundred microns is sufficient to induce an appreciable asymmetry, we require the electrode to be positioned to within perhaps 10 μm of its ideal position, or must consider some means of in situ correction of manufacturing errors.