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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 1, 2002, Pages 174-179

Ti diffusion in ion prebombarded MgO(100). I. A model for quantitative analysis

(5) Lu, M a Lupu, C a Styve, V J a Lee, S M a Rabalais, J W a

a University of Houston (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; DEFECTS; DIFFUSION IN SOLIDS; EVAPORATION; HARDENING; ION BOMBARDMENT; MATHEMATICAL MODELS; SECONDARY ION MASS SPECTROMETRY; TITANIUM;

ION IRRADIATION; MOBILE DEFECTS; NON STEADY STATE CONDITION;

MAGNESIA;

EID: 0036160358 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1427885 Document Type: Article

Times cited : (8)

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