High energy implantation by ion projection

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 257-260

  Meijer, J ^a   Stephan, A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON OPTICS; FOCUSING; ION BEAM LITHOGRAPHY; ION BEAMS; LENSES;

ION PROJECTORS;

ION IMPLANTATION;

EID: 4243666708     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00059-8     Document Type: Article

References (8)

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2. E. Cekan, W. Fallmann, W. Friza, F. Paschke, G. Stangl, P. Hudek, E. Bayer, H. Kraus, Microelec. Eng. 17 (1992) 241.
3. A. Stephan, J. Meijer, H.H Bukow and C. Rolfs, Nucl. Instr. and Meth. B104 (1995) 31.
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8. J. Meijer, A. Stephan, H.H. Bukow, C. Rolfs and F. Bruhn, Nucl. Instr. and Meth. B 104 (1995) 77.