Stencil masks for high energy ion projection

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 489-492

  Weidenmuller U ^a   Meijer, J ^a   Stephan, A ^a   Bukow, H H ^a   Rolfs, C ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT CONDUCTION; ION BEAM LITHOGRAPHY; THERMAL EXPANSION;

SPUTTER EFFECTS; STENCIL MASKS;

MASKS;

EID: 0033131679     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00048-9     Document Type: Article

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3. 3. A. Chalupka, J. Fegerl, R. Fischer, G. Lammer, H. Löschner, L. Malek, R. Nowak, G. Stengl, C. Traher and P. Wolf, Microelec. Eng. 17 (1992) 229.
4. 4. J.Melngailis, A.A.Mondelli, I.L.Berry III, R.Mohondro, J.Vac.Sci.Technol.B 16 (1998) 927.
5. 5. A. Stephan, J. Meijer, H.H Bukow and C. Rolfs, Nucl. Instr. and Meth. B104 (1995) 31.
6. 6. J. Meijer, A. Stephan, H.H. Bukow, C. Rolfs and F. Bruhn, Nucl. Instr. and Meth. B 104 (1995) 77.
7. 7. J. F. Ziegler, TRIM, IBM 1991.
8. 8. J.L.Vossen, Kern, "Thin ilm processes", New York, Acad.Press, 1978.