Synergic effect of acetal based resin by blending with poly[4-ydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248 nm chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 651-659

  Kim, Hyun Jin ^a   Chung, Yoon Sik ^a   Lee, Dong Hwal ^a   Cho, Sook Hee ^a   Im, Kwang Hwyi ^a   Yim, Yoon Gil ^a   Kim, Deog Bae ^a   Kim, Jaehyun ^a  

^a Dongjin Semichem Co Ltd   (South Korea)

Author keywords

Blending Resin; KrF lithography; KrF resist; Polymer structure

Indexed keywords

ACRYLIC MONOMERS; ACTIVATION ENERGY; POLYMER BLENDS; POLYSTYRENES;

POLYMER STRUCTURE;

PHOTORESISTS;

EID: 0036029434     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474265     Document Type: Conference Paper

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