Process margin in ArF lithography considering process window distortion

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 828-836

  Okabe, Ichiro ^a   Ohfuji, Takeshi ^a   Endo, Masayuki ^a   Morimoto, Hiroaki ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; EXCIMER LASERS; TRANSPARENCY;

PHOTOACID GENERATORS;

PHOTORESISTS;

EID: 0032671537     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350271     Document Type: Conference Paper

References (5)