Advanced ARCH resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 972-986

  Bantu, N R ^a   Marshall, J ^a   Holt, T ^a   Perry, D ^a   Khan, D ^a  

^a Olin Microelectronic Materials   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; DISSOLUTION; ETHERS; ORGANIC COMPOUNDS; SHRINKAGE;

ACID CATALYSIS; DE-PROTECTION REACTIONS; DISSOLUTION RATES; IDENTICAL CONDITIONS; NON VOLATILES; ROOM TEMPERATURES; VINYL ETHERS;

POLYMERS;

EID: 0005046714     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312368     Document Type: Conference Paper

References (19)

1. E. Reichmanis and L. F. Thompson, Adv. Chem. Ser. 245 (1995) 85.
2. H. Ito, Jpn. J. Appl. Phys. 31 (1992) 4273.
3. O. Nalamasu, M. Cheng, J. M. Kometani, S. Vaidya, E. Reichmanis and L. F. Thompson, Proc. SPIE, Adv. Resist Technol. Process X 1262 (1990) 32.
4. J. W. Thackery, T. Adams, M. F. Cronin, M. Denison, T. H. Fedynyshyn, J. Georger, J. M. Mori, G. W. Orsula and R. Sinta, J. Photopolymer Sci. Technol. 7(3), 619 (1994).
5. H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. Petrillo and D. Seeger, J. Photopolymer Sci. Technol. 7 (3), 433 (1994).
6. O. Nalamasu, A. G. Timko, M. Cheng, J. M. Kometani, M. Galvin, S. Heffner, S. G. Slater, A. G. Blakeney, N. Munzel, R. Schulz, H. Holzwarth, C. Mertersdorf and T. Schacht, Proc. SPIE, 1925, 155 (1993).
7. H. Ito and C. G. Wilson, ACS Symposium Ser, 242, 11 (1984).
8. S. Macdonald, N. Cecak, R. Wendt, G. Wilson, C. Snyder, C. Knors, N. Deyoe, J. Maltabes, J. Morrow, A. Mcguire and S. Holmes, Proc. SPIE, 1466 (1991) 2.
9. C. A. Mack, Proc. SPIE, 538, 207 (1985).
10. C. A. Mack, J. Electrochem. Soc. 134(1), 148 (1987).
11. T. Itani, H. Iwasaki, H. Yoshino, M. Fujimoto, K. Kasama, SPIE 2438, 191 (1995).
12. N. Rao Bantu, B. Maxwell, A. Medina, T. Sarubbi, M. Toukhy, H. T. Schacht, P. Falcigno, N. Munzel, K. Petschel, F. M. Houlihan, O. Nalamasu, A.. Timko, Proc. SPIE 3049 (1997) 324.
13. C. Mertersdorf, B. Nathal, N. Munzel, H. Holzwarth and H. T. Schacht, Proc. SPIE, Adv. Resist Technol. Process. XI 2195 (1994) 246.
14. T. Hattori, L. Schlegel, A. Imai, N. Hayashi and T. Ueno, J. Photopolym. Sci. Technol. 6 (1993) 497.
15. T. Hattori, L. Schlegel, A. Imai, N. Hayashi and T. Ueno, Proc. SPIE, Adv. Resist Technol. Process X 1925 (1993) 146.
16. S. A. M. Hesp, N. Hayashi and T. Ueno, J. Appl. Polym. Sci. 42 (1991) 877.
17. C. Mertesdorf, N. Munzel, T. X. Neenan, Proc. SPIE, Adv. Resist Technol. Process. XII 2438 (1995) 84.
18. J. Cameron, A. J. Orellana, M. M. rajaratham, R. F. Sinta, SPIE, Adv. Resist Technol. Process. XIII 2724 (1996) 261.
19. H. T. Schacht, et. al. J. Photopolymer Sci. Technol. 9 (1996) 573.