In-situ X-ray reflectivity measurement of the interface roughness of the tantalum pentoxides thin film during the RF magnetron sputtering deposition

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4703, Issue , 2002, Pages 37-45

  Lee, Chih Hao ^a   Huang, Tzu Wen ^a   Lee, Hsin Yi ^b   Hsieh, Yung Wei ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b Syncotron Radiation Research Center   (Taiwan)

Author keywords

Magnetron sputtering; Surface roughness; Tantalum oxide thin film; X ray reflectivity

Indexed keywords

COALESCENCE; ELECTROMAGNETIC WAVE REFLECTION; MAGNETRON SPUTTERING; NUCLEATION; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; THIN FILMS; X RAYS;

INTERFACE ROUGHNESS;

INTERFACES (MATERIALS);

EID: 0036028976     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.469629     Document Type: Article

References (26)

1. A.Y. Mao, K.-A. Son, D.A. Hess, L.A. Brown, J.M. White, D.L. Kwong, D.A. Roberts, R.N. Vrtis, Thin Solid Films 349, pp. 230-237, 1999.
2. J.W. Soh and W.J. Lee, Jpn. J. Appl. Phys, Part 1 34, pp. 3666-3667, 1995.
3. H.J. Park, A. Mao, D.L. Kwong, and J.M. White, J. Vac. Sci. Technol. A 18(5), pp. 2522-2526, 2000.
4. T. Ohmi, M. Miyashita, M. Itano, T. Imapka, I. Kawanobe, IEEE Trans Electron. Device 39, pp. 537-545, 1992.
5. H. Ono, Y. Hosokawa, T. Ikarashi, K. Shinoda, N. Ikarashi, K.-I. Kayanagi and H. Yamaguchi, J. Appl. Phys., 89, pp. 995-1002, 2001.
6. T.W. Huang, H.Y. Lee, Y.W. Hsieh, C.H. Lee, J. Cryst. Growth, (in press, 2002).
7. J.P. Chauvineau, Revue Phys. Appl. 23, pp. 1645-1652, 1988.
8. H. You, R.P. Chiarello, H.K. Kim, and K.G. Vandervoort, Phys. Rev. Lett. 70, pp. 2900-2903, 1993.
9. C.H. Lee, and S.Y. Tseng, Appl. Surf. Sci., 92, pp.282-286, 1996.
10. C.H. Lee, and S.Y. Tseng, J. Appl. Cryst., 31, pp. 181-184, 1998.
11. C.H. Lee, H.Y. Lee, K.S. Liang and T.B. Wu, Physica B248, pp.109-114, 1998.
12. C.H. Lee, K.L. Yu and H.C. Lee, Nucl. Instrum. Meth. A467-468, pp.1073-1076, 2001.
13. H. Ono and K. Koyanagi, Appl. Phys. Lett., 75, pp. 352-354, 1999.
14. L.G. Parratt, Phys. Rev. 95, pp. 359-369, 1954.
15. L. Nevot, and P. Croce, Revue Phys. Appl. 15, pp. 761-779, 1980.
16. M. Kardar, G. Paris, Y.C. Zhang, Phys. Rev. Lett., 56, pp. 889-893, 1989.
17. F. Family, Physica A168, pp. 561-580, 1990.
18. H.N. Yang, G.C. Wang, and T.M. Lu, Diffraction from Rough Surfaces and Dynamic Growth Fronts, pp. 136-168, Singapore:World Scientific 1992.
19. R.C. Ross, R. Messier, J. Appl. Phys., 54, pp. 5744-5749, 1983.
20. R. Lipperheide, M. Weber, H. Leeb, Physica B283, pp. 242-247, 2000.
21. R. Lipperheide, G. Reiss, H. Leeb, H. Fiedeldey, S.A. Sofianos, Phys. Rev., B51, pp. 11032-11038, 1995.
22. C.F. Majkrzak, N.F. Berk, V. Silin, C.W. Meuse, Physica B 238, pp. 248-252, 2000.
23. A. Van der Lee, Physica B283, pp.273-277, 2000.
24. C.H. Lee, K.L. Yu, M.H. Lee, J.C.A. Huang and G.P. Felcher, J. Mag. Mag. Mater., 209, pp. 110-112, 2000.
25. S.K. Sinha, E.B. Sirota, S. Garoff and H.B. Stanley, Phys. Rev. B38, pp. 2297-2311, 1988.
26. S.K. Sinha, Physica, B173, pp. 25-34, 1991.