In situ X-ray reflectivity measurement of thin film growth during vacuum deposition

Applied Surface Science

Volumn 92, Issue , 1996, Pages 282-286

  Lee, Chih Hao ^a,b   Tseng, Sung Yuh ^a,b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; DEPOSITION; ELLIPSOMETRY; HIGH ENERGY ELECTRON DIFFRACTION; MATHEMATICAL MODELS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

HIGH RESOLUTION LOW ENERGY ELECTRON DIFFRACTION; IN SITU X RAY REFLECTIVITY MEASUREMENT; INTERFACE ROUGHNESS; VACUUM DEPOSITION;

FILM GROWTH;

EID: 0030562327     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00242-1     Document Type: Article

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