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Volumn 248, Issue 1-4, 1998, Pages 109-114

In situ fixed angle X-ray reflectivity study of sputter-deposited amorphous LaNiO3 thin film on Si substrate

Author keywords

In situ deposition; LaNio3 thin film; X ray reflectivity

Indexed keywords

AMORPHOUS FILMS; COALESCENCE; DENSITY MEASUREMENT (SPECIFIC GRAVITY); ELECTROMAGNETIC WAVE REFLECTION; LANTHANUM COMPOUNDS; MAGNETRON SPUTTERING; SILICON WAFERS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; THIN FILMS; X RAY ANALYSIS;

EID: 0032094043     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(98)00213-0     Document Type: Article
Times cited : (8)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.