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Volumn 248, Issue 1-4, 1998, Pages 109-114
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In situ fixed angle X-ray reflectivity study of sputter-deposited amorphous LaNiO3 thin film on Si substrate
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Author keywords
In situ deposition; LaNio3 thin film; X ray reflectivity
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Indexed keywords
AMORPHOUS FILMS;
COALESCENCE;
DENSITY MEASUREMENT (SPECIFIC GRAVITY);
ELECTROMAGNETIC WAVE REFLECTION;
LANTHANUM COMPOUNDS;
MAGNETRON SPUTTERING;
SILICON WAFERS;
SPUTTER DEPOSITION;
SURFACE ROUGHNESS;
THICKNESS MEASUREMENT;
THIN FILMS;
X RAY ANALYSIS;
FIXED ANGLE X RAY REFLECTIVITY ANALYSIS;
LANTHANUM NIOBATE;
CONDUCTIVE FILMS;
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EID: 0032094043
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-4526(98)00213-0 Document Type: Article |
Times cited : (8)
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References (21)
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