Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 56, Issue 11, 2001, Pages 2321-2330

  Vereecke, G ^a   Arnauts, S ^a   Van Doorne, P ^a   Kenis, K ^a   Onsia, B ^a   Verstraeten, K ^a   Schaekers, M ^a   Van Hoeymissen, J A B ^a   Heyns, M M ^a  

^a IMEC   (Belgium)

Author keywords

Metallic impurities; Silicon nitride; Thin films; Total reflection X ray fluorescence; Trace analysis

Indexed keywords

CONTAMINATION; FLUORESCENCE; LIGHT REFLECTION; SILICON NITRIDE; THERMAL EFFECTS; THIN FILMS; VAPORIZATION; X RAY ANALYSIS;

DROPLET COLLECTION (DC) METHOD;

TRACE ANALYSIS;

EID: 0035976304     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(01)00311-1     Document Type: Conference Paper

References (28)

1. Fluorine compounds, inorganic