The development of a high-rate technology for wide-bandgap photosensitive a-SiC:H alloys

Journal of Alloys and Compounds

Volumn 327, Issue 1-2, 2001, Pages 146-150

  Budaguan, B G ^a   Sherchenkov, A A ^a   Gorbulin, G L ^a   Chernomordic, V D ^b  

^a Institute of Electronic Technology   (Russian Federation)

^b RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

AFM; Optical materials; RBS; Semiconductors; Vapour deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL REACTIONS; DEPOSITION; ENERGY GAP; OPTICAL MATERIALS; PHOTOSENSITIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SILICON CARBIDE;

PHOTOSENSITIVE ALLOYS;

SILICON ALLOYS;

EID: 0035975181     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(01)01422-0     Document Type: Article

References (9)