High rate deposition of TiO2 and SiO2 films by radical beam assisted deposition (RBAD)

Thin Solid Films

Volumn 392, Issue 2, 2001, Pages 191-195

  Harada, Takahiro ^a   Yamada, Yasumi ^a   Uyama, Haruo ^a   Murata, Takanori ^b   Nozoye, Hisakazu ^c  

^a TOPPAN PRINTING CO LTD   (Japan)

^b Shincron Co Ltd   (Japan)

^c NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

Optical coatings; Physical vapor deposition; Silicon oxide; Titanium oxide

Indexed keywords

ION BEAM ASSISTED DEPOSITION; OPTICAL GLASS; PHYSICAL VAPOR DEPOSITION; SILICA; SUBSTRATES; TITANIUM DIOXIDE;

RADICAL BEAM ASSISTED DEPOSITION (RBAD);

OPTICAL FILMS;

EID: 0035974533     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01026-4     Document Type: Conference Paper

References (18)