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Volumn 78, Issue 18, 2001, Pages 2727-2729

Direct patterning of nanometer-scale silicide structures on silicon by ion-beam implantation through a thin barrier layer

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[No Author keywords available]

Indexed keywords


EID: 0035971687     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1369608     Document Type: Article
Times cited : (10)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.