Submicron CoSi2 structures fabricated by focused ion beam implantation and local flash lamp melting

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 112, Issue 1-4, 1996, Pages 201-205

  Bischoff, L ^a   Heinig, K H ^a   Teichert, J ^a   Skorupa, W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COBALT COMPOUNDS; ION BEAM LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR GROWTH; SILICON WAFERS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

FOCUSED ION BEAM IMPLANTATION; HETERONUCLEATION; LOCAL FLASH LAMP MELTING;

ION IMPLANTATION;

EID: 0030563371     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01250-8     Document Type: Article

References (12)

1. J.A. Liddle, N.M. Zimmermann, A.E. White, K.T. Short and L. Fetter, Mater. Res. Soc. Symp. Proc. 279 (1993) 881.
2. A.E. White, K.T. Short, R.C. Dynes, J.P. Garno and J.M. Gibson, Appl. Phys. Lett. 50 (1987) 95.
3. J. Teichert, L. Bischoff, E. Hesse, D. Panknin and W. Skorupa, Mater. Res. Soc. Symp. Proc. 316 (1994) 741 and 320 (1994) 153.
4. J. Teichert, L. Bischoff, E. Hesse, D. Panknin and W. Skorupa, Mater. Res. Soc. Symp. Proc. 316 (1994) 741 and 320 (1994) 153.
5. K.-H. Heinig, M. Voelskow, J. Matthäi, A. Zetzsche and C. Treutler, Proc. Int. Conf. on Energy Pulse Modification of Semiconductors and Related Materials, EPM '84, Dresden, September 25-28 (1984) p. 280.
6. K.-H. Heinig, Proc. Int. Conf. on Energy Pulse Modification of Semiconductors and Related Materials, EPM '84, Dresden, September 25-28 (1984) p. 265.
7. L. Bischoff, J. Teichert, E. Hesse, D. Panknin and W. Skorupa, J. Vac. Sci. Technol. B 12 (6) (1994) 3523.
8. T.B. Massalski, in: Binary Alloy Phase Diagrams (ASM International, 1990).
9. L. Bischoff, J. Teichert and E. Hesse, Microelectron. Eng. 27 (1995) 351.
10. W. Ostwald, Z. Phys. Chem. 34 (1900) 495.
11. I.M. Lifshitz and V.V. Slyozov, J. Phys. Chem. Solids 19 (1961) 35.
12. C. Wagner, Z. Elektrochem. 65 (1961) 581.