Focused ion-beam structuring of Si and Si/CoSi2 heterostructures using adsorbed hydrogen as a resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 3, 1999, Pages 945-948

  Fuhrmann, H ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644451238     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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