Structural control of TiO2 film grown on MgO(001) substrate by Ar-ion beam sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2485-2488

  Aoki, Toshihiko ^a   Maki, Kunisuke ^a   Tang, Qi ^b   Kumagai, Yoshinori ^b   Matsumoto, Shigeharu ^b  

^a YOKOHAMA CITY UNIVERSITY   (Japan)

^b Shincron Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031511283     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580914     Document Type: Article

References (13)

1. R. Roy and W. B. White, J. Cryst. Growth 13/14, 78 (1972).
2. L. M. Williams and D. W. Hess, J. Vac. Sci. Technol. A 1, 1810 (1983).
3. L. S. Hsu, R. Rujkorakarn, J. R. Sites, and C. Y. She, J. Appl. Phys. 59, 3475 (1986).
4. D. Wicaksana, A. Kobayashi, and A. Kinbara, J. Vac. Sci. Technol. A 10, 1479 (1992).
5. T. Terashima, Y. Bando, K. Iijima, K. Yamamoto, K. Hirata, K. Hayashi, K. Kamigaki, and H. Terauchi, Phys. Rev. Lett. 65, 2684 (1990).
6. H. Tabata, H. Tanaka, T. Kawai, and M. Okuyama, Jpn. J. Appl. Phys., Part 1 34, 544 (1995).
7. H. Tabata, H. Tanaka, and T. Kawai, Jpn. J. Appl. Phys., Part 1 34, 5146 (1995).
8. Y. Bando, S. Horii, and T. Takada, Jpn. J. Appl. Phys. 17, 1037 (1978).
9. T. Fujii, M. Takano, R. Katano, Y. Bando, and Y. Isozumi, J. Appl. Phys. 66, 3168 (1989).
10. S. H. Wolff, S. Wagner, J. C. Bean, R. Hull, and J. M. Gibson, Appl. Phys. Lett. 55, 2017 (1989).
11. A. Zur and T. C. McGill, J. Appl. Phys. 55, 378 (1984).
12. T. Zheleva, K. Jagannadham, and J. Narayan, J. Appl. Phys. 75, 860 (1994).
13. A. Hoshino, S. Isoda, H. Kurata, and T. Kobayashi, J. Appl. Phys. 76, 4113 (1994).