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Thin Solid Films

Volumn 310, Issue 1-2, 1997, Pages 184-193

Epitaxial growth of titanium oxide thin films on MgO(100) single-crystal substrates by reactive deposition methods

(5) Imai, Fumikazu a,c Kunimori, Kimio a Manabe, Takaaki b Kumagai, Toshiya b Nozoye, Hisakazu b

a UNIVERSITY OF TSUKUBA (Japan)

b NATL INST OF MAT AND CHEM RES (Japan)

c MEC Laboratory (Japan)

Author keywords

Epitaxy; Oxidation; Physical vapor deposition (PVD); Titanium oxide

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; MAGNESIA; SEMICONDUCTING FILMS; SINGLE CRYSTALS; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION;

PHYSICAL VAPOR DEPOSITION (PVD);

CONDUCTIVE FILMS;

EID: 0031269661 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00341-6 Document Type: Article

Times cited : (15)

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