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Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

Adjusting chemical bonding of hard amorphous CSixNy thin films by N*-plasma-assisted Pulsed Laser Deposition

(6) Tharigen T a Lorenz, M a Koivusaari, K J b Streubel, P a Hesse, R a Szargan, R a

a UNIVERSITY OF LEIPZIG (Germany)

b UNIVERSITY OF OULU (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001692109 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390051555 Document Type: Article

Times cited : (3)

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