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Journal of Applied Physics

Volumn 89, Issue 12, 2001, Pages 8163-8168

Impact of exposure induced refractive index changes of photoresists on the photolithographic process

(3) Erdmann, Andreas a Henderson, Clifford L b Willson, C Grant c

a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB (Germany)

b Georgia Institute of Technology (United States)

c The University of Texas at Austin (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035875627 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1359165 Document Type: Article

Times cited : (9)

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