Influence of optical nonlinearities of the photoresist on the photolithographic process: basics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 529-540

  Erdmann, Andreas ^a   Henderson, Clifford L ^a   Willson, C Grant ^a   Henke, Wolfgang ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BLEACHING; NONLINEAR OPTICS; PHOTORESISTS; REFRACTIVE INDEX;

OPTICAL MICROLITHOGRAPHY; PROCESS WINDOWS;

PHOTOLITHOGRAPHY;

EID: 0031374473     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276032     Document Type: Conference Paper

References (12)